Printing Defect Detection on Embossed Surfaces Via Modified Multiple Paired Pixel Consistency Model
摘要
Defect detection plays a critical role in modern manufacturing by ensuring product quality and operational efficiency, particularly in precision-critical industries where microscopic imperfections can lead to significant functional failures. Our proposed framework addresses this challenge through a novel statistical framework termed Multiple Paired Pixel Consistency (MPPC), which implements systematic defect identification by analyzing structured brightness correlations between geometrically constrained pixel pairs. This methodology employs hypothesis testing to quantify correlation consistency, demonstrating exceptional sensitivity to microstructural anomalies on embossed surfaces that conventional computer vision techniques typically overlook. To optimize detection robustness, we introduce Position-Dependent Data Inhibition (PDI)—an adaptive outlier suppression mechanism employing quantile regression and spatial probability mapping to dynamically adjust detection thresholds across heterogeneous surface regions. Extensive experiments with real-world defect data demonstrate these methods’ superior effectiveness and reliability.