Logic Gate Design for In-memory Computing with Sputtered Hafnium Oxide Based Memristor
摘要
Artificial intelligence has advanced with the emergence of deep learning techniques. However, the performances of deep neural networks in Von Neumann architectures are limited by the memory bottleneck. In-memory computing using memristive devices, is a promising solution, with significant improvement in speed, efficiency, and scalability. This work demonstrates the application of RF-sputtered Hafnium Oxide (HfOx) based memristive device for implementing logic gates targeted at In-memory computing applications. A model for Pt/HfOx/Ag based memristor was developed, adopting the Voltage ThrEshold Adaptive Memristor (VTEAM) model, showing close match with experimental I-V data (rms error:0.0078). The Verilog-A model for this memristive device was developed and implemented in Cadence Virtuoso circuit simulator and realized basic logic gates using the Memristor Aided Logic design-MAGIC and analyzed its performances in terms of delay and energy. This work bridges the gap between experimental validation, theoretical modeling, and circuit implementation, illustrating the potential of HfOx-based memristor for high performance, energy efficient computations.