In this experimental investigation, TiSiN thin film coating has been deposited over p-type cubic-Si (100) wafer through the chemical route (chemical vapor deposition-CVD) method in the presence of N2 gas and followed by annealing at 800 °C for 4 h. The synthesis is carried out using TiO2 and Si3N4 (mixed in a rectangular crucible bowl) powders. The deposition was carried out at 600 °C temperatures. The morphological analysis has suggested that the film’s porosity reduced significantly after annealing. The corrosion property of the annealed thin film has been improved significantly. The structural property has also been analyzed by the XRD process, and hardly any other phases from the annealed TiSiN thin film compared to the deposited TiSiN thin film coating. In the mechanical property analysis of deposited and annealed coatings, slight changes have been observed in between.

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An Experimental Effort Implemented over CVD TiSiN Thin Film Coating to Improve Mechanical and Corrosion Properties by Annealing

  • Spandan Guha,
  • Soham Das

摘要

In this experimental investigation, TiSiN thin film coating has been deposited over p-type cubic-Si (100) wafer through the chemical route (chemical vapor deposition-CVD) method in the presence of N2 gas and followed by annealing at 800 °C for 4 h. The synthesis is carried out using TiO2 and Si3N4 (mixed in a rectangular crucible bowl) powders. The deposition was carried out at 600 °C temperatures. The morphological analysis has suggested that the film’s porosity reduced significantly after annealing. The corrosion property of the annealed thin film has been improved significantly. The structural property has also been analyzed by the XRD process, and hardly any other phases from the annealed TiSiN thin film compared to the deposited TiSiN thin film coating. In the mechanical property analysis of deposited and annealed coatings, slight changes have been observed in between.