Photoresists are light-sensitive materials used in lithography, and they function as imageable masks in etching, electroplating, and electroforming processes, thus enabling precise patterning in microfabrication (Guo et al. in Adv. Funct. Mater. 34:2,310,338, 2024). It comprises a polymer (resin), a sensitizer (photoactive compound), and a solvent.