Enhancing High-Resolution Optical Systems: Optimization of Lens Performance Through Advanced Vignetting Techniques and Diffraction Effects
摘要
This study presents an optical system with an effective focal length (EFL) of 25 mm and an entrance pupil diameter (EPD) of 10 mm, yielding an f-number of 2.5. The lens was designed for optimal performance across three wavelengths, 586, 488, and 665 nm, covering the visible spectrum, and evaluated at field angles of 0°, 15°, and 26°. Results demonstrate that a proposed vignetting technique significantly enhances image quality, with point spread functions (PSFs) indicating near-diffraction-limited performance. Strehl ratios achieved are 94.4% for the 0° field and 85.4% for both 15° and 26° fields, underscoring the system’s suitability for high-resolution applications like semiconductor lithography. Additionally, 2D image simulations confirm the lens’s improved performance. This work highlights the critical role of addressing diffraction effects and employing vignetting techniques in optimizing lens performance, achieving superior image quality, and meeting high standards in optical design.