This chapter details the experimental procedures employed to fabricate the two-dimensional (2D) materials and device architectures investigated throughout the thesis. The focus is on accessible and reproducible methods that allow for the creation of nanostructures tailored to specific research objectives. The chapter begins with an overview of the mechanical exfoliation techniques used to isolate individual layers of various 2D materials, including graphene, hexagonal boron nitride, indium selenide and molybdenum disulfide. Each exfoliation process is preceded by precise substrate preparation to ensure optimal adhesion and flake quality. Following exfoliation, the fabrication of heterostructures is described, highlighting the importance of alignment, stacking order and interface compatibility. The chapter then covers the assembly of nanodevices, including etching strategies for accessing internal layers and methods for depositing metallic contacts with minimal contamination. To further refine device cross-sections and enable advanced characterisation, beam exit cross-sectional polishing is introduced as a complementary preparation technique. Altogether, this chapter outlines a complete set of fabrication protocols designed to preserve the intrinsic properties of 2D materials while enabling their integration into functional systems. These procedures form the experimental foundation for the investigations of thermoelectric, thermal and electromechanical phenomena presented in the subsequent chapters.

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Applied Methods for Materials and Structures Preparation

  • Sergio Gonzalez-Munoz

摘要

This chapter details the experimental procedures employed to fabricate the two-dimensional (2D) materials and device architectures investigated throughout the thesis. The focus is on accessible and reproducible methods that allow for the creation of nanostructures tailored to specific research objectives. The chapter begins with an overview of the mechanical exfoliation techniques used to isolate individual layers of various 2D materials, including graphene, hexagonal boron nitride, indium selenide and molybdenum disulfide. Each exfoliation process is preceded by precise substrate preparation to ensure optimal adhesion and flake quality. Following exfoliation, the fabrication of heterostructures is described, highlighting the importance of alignment, stacking order and interface compatibility. The chapter then covers the assembly of nanodevices, including etching strategies for accessing internal layers and methods for depositing metallic contacts with minimal contamination. To further refine device cross-sections and enable advanced characterisation, beam exit cross-sectional polishing is introduced as a complementary preparation technique. Altogether, this chapter outlines a complete set of fabrication protocols designed to preserve the intrinsic properties of 2D materials while enabling their integration into functional systems. These procedures form the experimental foundation for the investigations of thermoelectric, thermal and electromechanical phenomena presented in the subsequent chapters.