The quality of photoresistPhotoresist has a significant impact on the photolithographyPhotolithography processProcess. This article provides a comprehensive analysis of patent applications, the source country/region of technology, the target country/region, IPC classification, the legal status, the technology layout, and key technologies in the photoresistPhotoresist field. Research has found that photoresistPhotoresist patent technology can be roughly divided into four stages: the embryonic stage (1954–1979), the growth stage (1980–1995), the rapid growth stage (1996–2008), and the mature stage (2009-present). In the field of photoresistPhotoresist, the applicants from United States and Japan have an absolute advantage in technological strengthStrength, and have formed a relatively rigorous patent technology and regional layout in multiple countries/regions around the world. The photosensitive resin in photoresistPhotoresist components, as well as the development and lift-off processesProcess in photolithographyPhotolithography, are key technologies in the field of photoresistPhotoresist, with high patent qualityPatent quality and patent activity.