The results are presented of the study of the kinetics of dispersion of nickel nanofilms 100 nm thickness, applied to the surface of samples made of quartz glass, alumina ceramics, leucosapphire, silicon nitride ceramics, glassy carbon, and annealed in a vacuum at temperatures of 1000 ÷ 1200 °C for different exposition times at each temperature between 2 and 20 min.

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Dispersion Kinetics During Vacuum Annealing of Nickel Nanofilms Deposited onto Non-metallic Materials

  • T. V. Stetsyuk,
  • O. V. Durov,
  • O. M. Fesenko

摘要

The results are presented of the study of the kinetics of dispersion of nickel nanofilms 100 nm thickness, applied to the surface of samples made of quartz glass, alumina ceramics, leucosapphire, silicon nitride ceramics, glassy carbon, and annealed in a vacuum at temperatures of 1000 ÷ 1200 °C for different exposition times at each temperature between 2 and 20 min.