Spin coating is a critical technique in various fields such as semiconductor fabrication and nanotechnology due to its ability to produce highly uniform and precise thin layers. This method involves rotating a disk with a substrate workpiece. The coating material is then deposited onto the center of the substrate, where it spreads across the surface due to centrifugal force. Near the disk center, the centrifugal force is minimal, resulting in a thicker coating in this region compared to the edges. To mitigate the issue of varying thickness due to the radius of the substrate disk, high rotational speeds are commonly used to achieve an acceptable average thickness. However, this approach can cause rapid solvent evaporation, surface defects, increased equipment strain, and higher energy consumption. Additionally, achieving consistent coating thickness is difficult with viscous materials or larger substrates, often necessitating lower rotational speeds. At these lower speeds, uniform thickness control remains challenging. This study proposes a modified spin-coater structure that incorporates assisted vibration to improve the average thickness of the coating material at low rotational speeds. The modified structure includes a vibration mechanism designed to enhance thickness uniformity across the substrate. Simulations are conducted to determine and verify the appropriate displacement amplitude of the vibration at the center of the rotational disk.