This chapter summarizes the key findings and results of the book and presents our outlook on future developments. Section 5.1 reiterates the available options and useful measures to prevent electromigration (EM) damage in current design flows; it also includes practical guidelines of their application. Sections 5.2–5.5 indicate how to facilitate an EM-compliant layout design in future EM-critical technology nodes. Here, key measures are physics-based modeling, EM-robust routing elements, applying new technologies, such as carbon nanotubes (CNTs), and the evolution toward constraint-driven design methodologies.