This chapter explores surface reconstruction (SR), the rearrangement of surface atoms on a crystal triggered by various factors, including thermal effects (high-temperature solid–gas environments), electrochemical factors (electric potential in a solid–liquid cell), and chemical factors (low-temperature surface reactions). The chapter delves into how the initial deposition stage during SR evolution on a specific surface plane (hkl) heavily influences the resulting two-dimensional adsorption layer pattern. In essence, SR acts as a corrective mechanism, adjusting the surface atomic arrangement in response to a stimulus. Surface reconstruction is contrasted with surface relaxation, where the atomic plane periodicity remains intact. Adsorption (the adhesion of particles to a surface) and deposition (the movement of particles towards an electrode surface) are also introduced. Electrochemical deposition, a technique for creating films on a conductor’s surface, is presented. The chapter focuses on ideal, atomically clean surfaces initially. However, real crystals have imperfections, and SR can be a solution. Adding atoms to a substrate can create a two-dimensional layer with a distinct crystal structure compared to the bulk. Two-dimensional translation vectors and matrices are used to describe SR on a specific surface plane (hkl). Thus, microscopy and diffraction are used to characterize the reconstructed surface, allowing comparison of the original substrate and the new two-dimensional layer.