Reclaimed Wastewater in the Semiconductor Industry
摘要
This chapter provides an extensive review of reclaimed wastewater (WW) strategies in the semiconductor industry, focusing on advanced treatment technologies and sustainable reuse methodologies. The focus is on membrane-based processes, such as ultrafiltration, nanofiltration, and reverse osmosis, which constitute the foundation of contemporary reclamation systems because of their high removal efficiency and reliability. This chapter also examines the role of advanced oxidation processes in degrading persistent organic contaminants, alongside the integration of hybrid treatment systems to achieve water quality suitable for reuse in ultrapure water (UPW) production. In addition to treatment technologies, this chapter addresses water reuse strategies, including cascade reuse, closed-loop recycling, and zero liquid discharge (ZLD), which facilitate substantial reductions in freshwater consumption. The management and potential valorization of sludge generated during treatment processes are explored, highlighting opportunities for resource recovery and implementation of a circular economy. Despite notable technological advancements, challenges such as membrane fouling, high energy requirements, and removal of low-molecular-weight contaminants remain significant barriers to large-scale implementation of this technology. This chapter identifies key research gaps and future directions, including the development of energy-efficient treatment systems, advanced materials, and integrated process optimization techniques. Overall, this study emphasizes the importance of WW reclamation as a fundamental aspect of sustainable semiconductor manufacturing, offering insights into current technologies, operational challenges, and emerging innovations that support high-efficiency water reuse and environmental compliance.