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Abstract <p>Methods of producing targets from high-entropy alloys for coating application by ion plasma sputtering are analyzed. The alloy composition is selected (Co–Cr–Fe–Mn–Ni–Cu), and the proportions of the chemical elements are determined. A technology is proposed for sintering pressed powder mixtures and producing targets of the required size and shape.</p>

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Producing High-Entropy Alloy Targets for Coating Application by Ion Plasma Sputtering

  • 期刊论文

  • 发表日期：

    2026年3月1日

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  • I. V. Kolesnikov,
  • A. P. Sychev,
  • E. S. Novikov

摘要

Abstract

Methods of producing targets from high-entropy alloys for coating application by ion plasma sputtering are analyzed. The alloy composition is selected (Co–Cr–Fe–Mn–Ni–Cu), and the proportions of the chemical elements are determined. A technology is proposed for sintering pressed powder mixtures and producing targets of the required size and shape.