Peculiarities of High-Temperature Interaction between Co2MnSi Heusler Alloy and Si Substrate
摘要
Abstract
High-temperature interaction between a melt of Co2MnSi Heusler alloy produced via self-propagating high-temperature synthesis and a silicon substrate was first investigated. Electron microscopy and X-ray phase analysis revealed that Co2MnSi melt actively interacts with Si, forming wide diffusion zones containing cobalt silicides (CoSi2 and CoSi).