Scholarlink

Abstract <p>Molecular dynamics simulation of the interaction processes of Ar<InlineEquation ID="IEq1"> <InlineMediaObject> <ImageObject Color="BlackWhite" FileRef="11972_2025_8835_Article_IEq1.gif" Format="GIF" Height="8" Rendition="HTML" Resolution="72" Type="Linedraw" Width="10" /> </InlineMediaObject> <EquationSource Format="TEX">\({}_{n}\)</EquationSource> <!--BPhysMGU2570086Nazarov-m1--> </InlineEquation> clusters with the Cu surface at different <InlineEquation ID="IEq2"> <InlineMediaObject> <ImageObject Color="BlackWhite" FileRef="11972_2025_8835_Article_IEq2.gif" Format="GIF" Height="19" Rendition="HTML" Resolution="72" Type="Linedraw" Width="36" /> </InlineMediaObject> <EquationSource Format="TEX">\(E/n\)</EquationSource> <!--BPhysMGU2570086Nazarov-m2--> </InlineEquation> ratios was performed. The mass distributions of sputtered fragments were calculated. It was shown that these distributions are described by a power law as a function of the fragment size. The dependences of the exponent on the energy and the size of the primary cluster were studied; it was shown that it correlates with the total sputtering yield similarly to the case of sputtering by atomic ions.</p>

错误：搜索内容不能为空，请输入英文关键词
错误：关键词超出字数限制，请精简
高级检索

Calculation of Mass Distributions of Cu Surface Fragments Sputtered by Ar Cluster Ions Based on Molecular Dynamics Simulation

  • 期刊论文

  • 发表日期：

    2025年8月1日

查看全文
  • A. V. Nazarov,
  • D. S. Kireev,
  • A. N. Rattsev,
  • V. S. Chernysh

摘要

Abstract

Molecular dynamics simulation of the interaction processes of Ar \({}_{n}\) clusters with the Cu surface at different \(E/n\) ratios was performed. The mass distributions of sputtered fragments were calculated. It was shown that these distributions are described by a power law as a function of the fragment size. The dependences of the exponent on the energy and the size of the primary cluster were studied; it was shown that it correlates with the total sputtering yield similarly to the case of sputtering by atomic ions.