Abstract <p>A method for estimating film thickness based on the color painting of the non-absorbing film-absorbing substrate system is proposed. The method can be useful for developing the technology of applying anti-reflective coatings to solar cells. The thickness of a dark blue anti-reflective SiO film applied to a silicon wafer was determined to illustrate the method.</p>

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Assessment of the Thickness of the Anti-Reflective Film of a Solar Cell by Color

  • V. G. Dyskin,
  • I. A. Yuldoshev,
  • U. B. Khamdamov

摘要

Abstract

A method for estimating film thickness based on the color painting of the non-absorbing film-absorbing substrate system is proposed. The method can be useful for developing the technology of applying anti-reflective coatings to solar cells. The thickness of a dark blue anti-reflective SiO film applied to a silicon wafer was determined to illustrate the method.