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<p>The trend towards higher aspect ratio structures, in both memory and logic devices, has set a tighter requirement on angle control for ion beams both in the horizontal and vertical plane. This new constraint on beam parallelism, at very low energy, coupled with the need for high productivity has brought a significant technical challenge to optics design and tuning control of ion implanters. Applied VIISta<i>®</i> Trident™ high current implanters, with ribbon beam architecture, are ideally suited to achieve excellent angle parallelism even at very low energy without compromising productivity. This paper discusses how angles, in the horizontal and vertical plane, are measured and controlled on the Trident beamline and its impact on device performance. In particular, we will discuss the process advantages of controlling local vertical angle spread on contact devices and the corresponding reduction in contact resistance.</p> Graphical abstract <p>(a). Normalized Rc versus Vwida mean ranges, showing 13% decrease of Rc when Vwida mean is decreased from 1.8&#xa0;deg to 1&#xa0;deg. (b). Effect of Vwida control on Rc on a Trident XP2. Some highflyers are associated with a tool PM issue.</p> <p></p>

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Angle control on ribbon beams on applied materials VIISta® Trident™ ion implanters

  • 期刊论文

  • 发表日期：

    2025年2月24日

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  • Antonella Cucchetti,
  • Sruthi Chennadi,
  • KyuHa Shim,
  • Sung Ho Jo,
  • YongSu Kim,
  • DukJoo Woo,
  • JooWan Park,
  • JungEun Lee,
  • ChangKweon Lee,
  • KyungJun Son,
  • JinHyuk Park

摘要

The trend towards higher aspect ratio structures, in both memory and logic devices, has set a tighter requirement on angle control for ion beams both in the horizontal and vertical plane. This new constraint on beam parallelism, at very low energy, coupled with the need for high productivity has brought a significant technical challenge to optics design and tuning control of ion implanters. Applied VIISta® Trident™ high current implanters, with ribbon beam architecture, are ideally suited to achieve excellent angle parallelism even at very low energy without compromising productivity. This paper discusses how angles, in the horizontal and vertical plane, are measured and controlled on the Trident beamline and its impact on device performance. In particular, we will discuss the process advantages of controlling local vertical angle spread on contact devices and the corresponding reduction in contact resistance.

Graphical abstract

(a). Normalized Rc versus Vwida mean ranges, showing 13% decrease of Rc when Vwida mean is decreased from 1.8 deg to 1 deg. (b). Effect of Vwida control on Rc on a Trident XP2. Some highflyers are associated with a tool PM issue.