Graphitic carbon nitride (g-C3N4): Pioneering nanomaterial to combat the bacterial biofilm infection
摘要
Bacterial biofilms pose a critical challenge in healthcare, industrial, and environmental settings due to their high tolerance to conventional antimicrobial therapies, significantly contributing to antimicrobial resistance (AMR). This necessitates the development of effective antibiofilm strategies. Graphitic carbon nitride (g–C3N4) has emerged as a promising nanomaterial with notable antibiofilm activity, attributed to its visible light-driven photocatalytic properties, enzyme-mimetic behavior, and biocompatibility. Upon light irradiation, g–C3N4 generates reactive oxygen species (ROS), inducing oxidative stress, bacterial membrane damage, and extracellular polymeric matrix degradation, thereby disrupting biofilms, while maintaining high physicochemical stability, low cytotoxicity, and enhanced surface reactivity. Modification approaches such as metal doping, heterojunction engineering, and polymer hybridization further improve antibiofilm performance by enhancing charge separation and ROS generation. Integration of g-C3N4 into drug delivery systems and combinatorial antimicrobial approaches highlights its potential for addressing AMR through rational nanomaterial design.
Graphical abstract