Impedance Spectroscopy of Memristive Structures Based on Hafnium Oxide
摘要
Memristive structures of Ti/HfO2/Au/c-Si, which are characterized by high ductility, are studied using the impedance spectroscopy method. Impedance hodographs are obtained for several stable resistive states. An equivalent circuit is proposed that takes into account the change in the resistance of filaments during their growth and allows for a good description of the observed changes in the type of the hodograph. Using simulation, the numerical values of the equivalent-circuit parameters are calculated. It is shown that during the switching process a significant change in the capacitance of the structure occurs. The data obtained allow us to better understand the processes that occur in such structures during switching, and open up the possibility of creating elements in which both resistance and capacitance can be controllably changed simultaneously.