Abstract <p>The article analyzes the potential and identifies the limitations of achieving technological sovereignty in the segment of electronic engineering for the case study of semiconductor lithography systems. It is shown that in the context of the deglobalization on the electronic engineering market, several groups of players are formed, differing in goals and strategies for achieving technological sovereignty. It is found that the technology race in the field of photolithography, which is the basis for the mass production of modern microelectronics, despite the prospects for further technological improvements, may face limitations in its development. It is revealed that during the transition from globalization to the localization of semiconductor production and the pursuit of technological sovereignty in the segment of semiconductor lithography, countries implement two main approaches, i.e., the recreation of traditional photolithography technology and the development of proprietary alternative methods. It is concluded that such a trend in the coming years may lead to a redistribution of shares between old and new equipment manufacturers and a change in the structure of technologies in the semiconductor lithography market.</p>

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Technological Sovereignty in Electronic Engineering: Opportunities and Limitations in the Context of Deglobalization

  • S. A. Il’ina

摘要

Abstract

The article analyzes the potential and identifies the limitations of achieving technological sovereignty in the segment of electronic engineering for the case study of semiconductor lithography systems. It is shown that in the context of the deglobalization on the electronic engineering market, several groups of players are formed, differing in goals and strategies for achieving technological sovereignty. It is found that the technology race in the field of photolithography, which is the basis for the mass production of modern microelectronics, despite the prospects for further technological improvements, may face limitations in its development. It is revealed that during the transition from globalization to the localization of semiconductor production and the pursuit of technological sovereignty in the segment of semiconductor lithography, countries implement two main approaches, i.e., the recreation of traditional photolithography technology and the development of proprietary alternative methods. It is concluded that such a trend in the coming years may lead to a redistribution of shares between old and new equipment manufacturers and a change in the structure of technologies in the semiconductor lithography market.