Investigation of Pulsed Laser Deposited Ni/TiO2/p-Si/Al Heterojunction using Impedance Spectroscopy at Low Temperatures
摘要
In this paper, the dielectric characteristics as a function of temperature and frequency for the Ni/TiO2/p-Si/Al heterojunction were studied. The X-ray diffraction studies have proved that deposited films are nanocrystals with particle size of 43.3 nm. The calculated roughness (Rq) of TiO2 film is 2.9 nm. By thermal coating pure aluminum and nickel metals were deposited to make the contacts to p-Si and n-TiO2, respectively. The capacitance and conductance measurements were carried out for the heterojunction in the temperature range from 80 to 300 K and in the frequency range of 10 kHz to 1 MHz. The study shows that the dielectric constant (