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Abstract <p>A brief description of lithographic capabilities is given at use of various radiation sources and approaches to the applying graphic drawings process organizing in the form of projection and scanning lithography. The main difficulty in implementing the creation of nanosized X-ray scanning lithography associated with the formation of nanosized X-ray beams of the required intensity is indicated, and an approach to overcoming it by using an X-ray waveguide resonance device of a special design is pointed. Experimental data characterizing the X-ray beam generated by this device are presented.</p>

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Formation of Nanoscale Radiation Fluxes for X-ray Scanning Lithography

  • 期刊论文

  • 发表日期：

    2025年12月1日

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  • V. K. Egorov,
  • E. V. Egorov

摘要

Abstract

A brief description of lithographic capabilities is given at use of various radiation sources and approaches to the applying graphic drawings process organizing in the form of projection and scanning lithography. The main difficulty in implementing the creation of nanosized X-ray scanning lithography associated with the formation of nanosized X-ray beams of the required intensity is indicated, and an approach to overcoming it by using an X-ray waveguide resonance device of a special design is pointed. Experimental data characterizing the X-ray beam generated by this device are presented.