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Abstract <p>This review studies the structure of thin films of titanium nitride formed by magnetron sputtering. A model of film growth depending on the deposition temperature and nitrogen flow is considered. The model is compared with the experimental results. The effect of annealing on the structure of magnetron titanium nitride films is described.</p>

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Structure of Thin Films of Titanium Nitride Formed by Magnetron Sputtering

  • 期刊论文

  • 发表日期：

    2025年6月1日

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  • A. G. Isaev,
  • A. E. Rogozhin

摘要

Abstract

This review studies the structure of thin films of titanium nitride formed by magnetron sputtering. A model of film growth depending on the deposition temperature and nitrogen flow is considered. The model is compared with the experimental results. The effect of annealing on the structure of magnetron titanium nitride films is described.