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Abstract <p>We analyzed the results obtained in a study of the elemental and phase compositions, as well as the defect substructure of a 5 μm thick film of a high-entropy alloy (HEA) of nonstoichiometric composition (18.4Al–23.6Ti–15.2Cu–23.6Zr–19.2Nb, at %). The HEA film was sputtered on a AISI 321 steel substrate and subjected to complex multicycle electron–ion–plasma saturation with boron. At the first stage of boriding, a 1 µm thick (Cr + B) film was deposited on the surface of the HEA specimens (QUINTA facility). At the second stage, the (Cr + B)-film/HEA-substrate system was irradiated with an intense pulsed electron beam (18 keV; 20, 30, and 40 J/cm<sup>2</sup>; 200 μs; 3 pulses, 0.3 s<sup>–1</sup>) on the SOLO facility at a 0.02 Pa residual gas (argon) pressure in the working chamber. The multicycle boriding consisted of triple repetition of the above procedure for producing the (Cr + B)-film/HEA-substrate system and irradiating it with a pulsed electron beam. The study has revealed that the modified HEA films had a multielement, multiphase, multilayer submicrometer-nanocrystalline structure. This structure showed high wear resistance due to the nanoparticles of boride released in the modified layer.</p>

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Multicycle Electron–Ion–Plasma Method for Producing Multiphase Nanostructured Boron-Containing Layers and Coatings

  • 期刊论文

  • 发表日期：

    2025年9月1日

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  • Yu. F. Ivanov,
  • E. A. Petrikova,
  • V. V. Shugurov,
  • N. A. Prokopenko,
  • A. D. Teresov,
  • O. S. Tolkachev

摘要

Abstract

We analyzed the results obtained in a study of the elemental and phase compositions, as well as the defect substructure of a 5 μm thick film of a high-entropy alloy (HEA) of nonstoichiometric composition (18.4Al–23.6Ti–15.2Cu–23.6Zr–19.2Nb, at %). The HEA film was sputtered on a AISI 321 steel substrate and subjected to complex multicycle electron–ion–plasma saturation with boron. At the first stage of boriding, a 1 µm thick (Cr + B) film was deposited on the surface of the HEA specimens (QUINTA facility). At the second stage, the (Cr + B)-film/HEA-substrate system was irradiated with an intense pulsed electron beam (18 keV; 20, 30, and 40 J/cm2; 200 μs; 3 pulses, 0.3 s–1) on the SOLO facility at a 0.02 Pa residual gas (argon) pressure in the working chamber. The multicycle boriding consisted of triple repetition of the above procedure for producing the (Cr + B)-film/HEA-substrate system and irradiating it with a pulsed electron beam. The study has revealed that the modified HEA films had a multielement, multiphase, multilayer submicrometer-nanocrystalline structure. This structure showed high wear resistance due to the nanoparticles of boride released in the modified layer.