Abstract <p>An approach to rapid (in less than 1 h) prototyping of X-ray microlenses from silica with an aperture of about 50 μm and a radius of curvature of 10 μm is presented. The formation of a concave microlens surface is achieved by using focused ion beam systems and isotropic etching in hydrofluoric acid. The presented approach allows obtaining a gain in the fabrication time by about 10 times compared to ion-beam lithography. Furthermore, the fabrication of a series of lenses will lead to a reduction in time costs proportional to the number of simultaneously processed lenses in an acid solution.</p>

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Method for Rapid Fabrication of Silicon Dioxide X-ray Microoptics

  • I. I. Lyatun,
  • S. S. Lyatun,
  • A. A. Snigirev

摘要

Abstract

An approach to rapid (in less than 1 h) prototyping of X-ray microlenses from silica with an aperture of about 50 μm and a radius of curvature of 10 μm is presented. The formation of a concave microlens surface is achieved by using focused ion beam systems and isotropic etching in hydrofluoric acid. The presented approach allows obtaining a gain in the fabrication time by about 10 times compared to ion-beam lithography. Furthermore, the fabrication of a series of lenses will lead to a reduction in time costs proportional to the number of simultaneously processed lenses in an acid solution.