Abstract <p>Growing demands for quality and diversity of microelectronic devices require innovative approaches to designing and creating high-precision components, which is associated with the increasing complexity of device architecture and miniaturization of elements. Additive methods for forming microsized structures, including aerosol printing, are becoming a promising addition and, in the µm size range, an alternative to traditional photolithography due to reduced costs and process flexibility. A new approach has been developed, and a dry aerosol printer has been created based on the synthesis of nanoparticles in a pulsed gas discharge, their transportation in a gas flow, focused deposition, and sintering by laser radiation, which eliminates the use of solvents and functional additives. This enables the creation of clean microstructures without post-processing, which opens up wide possibilities for integrating dry aerosol printing into microelectronics process routes. The method is relevant for the formation of passive elements of microelectronics, plasmonic layers of optoelectronic devices, microsensors, and catalytic structures.</p>