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Abstract <p>A potentiodynamic study is performed of the effect the cadmium complex of nitrile-trismethylenephosphonic acid Na<sub>4</sub>[Cd(H<sub>2</sub>O)N(CH<sub>2</sub>PO<sub>3</sub>)<sub>3</sub>]⋅7H<sub>2</sub>O has on the corrosion-electrochemical behavior of low-carbon steel in neutral iodide-containing aqueous media. The composition and structure of passivating films, spatial localization of inhibitor interaction with iron ions, and accompanying processes and products of these interactions, are studied via X-ray photoelectron spectroscopy with layer-by-layer etching. With 1.4&#xa0;mmol/dm<sup>3</sup> of I<sup>−</sup> ions, Na<sub>4</sub>[Cd(H<sub>2</sub>O)N(CH<sub>2</sub>PO<sub>3</sub>)<sub>3</sub>]⋅7H<sub>2</sub>O at a concentration of 0.05–0.5 g/dm<sup>3</sup> reduces the current density of anodic dissolution of metal. It stimulates corrosion at concentrations of 1.0 g/dm<sup>3</sup> and above. The optimum concentration of inhibitor is 0.2–0.5 g/dm<sup>3</sup>.</p>

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Efficiency of a Cadmium Complex of Nitril-trismethylenephosphonic Acid As a Corrosion Inhibitor of Low-Carbon Steel in Neutral Iodide-Containing Aqueous Media and Features of Formation of Passivating Films under These Conditions

  • 期刊论文

  • 发表日期：

    2025年4月25日

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  • I. S. Kazantseva,
  • F. F. Chausov,
  • V. L. Vorob’ev,
  • N. V. Lomova,
  • N. Yu. Isupov

摘要

Abstract

A potentiodynamic study is performed of the effect the cadmium complex of nitrile-trismethylenephosphonic acid Na4[Cd(H2O)N(CH2PO3)3]⋅7H2O has on the corrosion-electrochemical behavior of low-carbon steel in neutral iodide-containing aqueous media. The composition and structure of passivating films, spatial localization of inhibitor interaction with iron ions, and accompanying processes and products of these interactions, are studied via X-ray photoelectron spectroscopy with layer-by-layer etching. With 1.4 mmol/dm3 of I− ions, Na4[Cd(H2O)N(CH2PO3)3]⋅7H2O at a concentration of 0.05–0.5 g/dm3 reduces the current density of anodic dissolution of metal. It stimulates corrosion at concentrations of 1.0 g/dm3 and above. The optimum concentration of inhibitor is 0.2–0.5 g/dm3.