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Abstract <p>The paper presents the results of numerical simulations on the study of plasma-chemical processes in the Ar/CF<sub>4</sub> mixture in a short low-pressure glow discharge. It is shown that in the case of a 10% CF<sub>4</sub> impurity content, the discharge reaches stationary distributions of plasma parameters. In this case, the cathode and anode layers of the space charge, a narrow layer near the electron-ion plasma near the cathode layer and ion-ion plasma are formed. In the case of a small impurity of 1% CF<sub>4</sub> impurity, the discharge remains non-stationary over the entire considered time range. For the considered ranges of external parameters, the main products of CF<sub>4</sub> conversion are atomic F and molecular fluorine F<sub>2</sub>, as well as CF<sub>3</sub>.</p>

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Simulation of Plasma-Chemical Processes in Ar/CF4 Mixture in a Short Low-Pressure Glow Discharge

  • 期刊论文

  • 发表日期：

    2025年12月1日

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  • A. I. Saifutdinov,
  • V. A. Purin

摘要

Abstract

The paper presents the results of numerical simulations on the study of plasma-chemical processes in the Ar/CF4 mixture in a short low-pressure glow discharge. It is shown that in the case of a 10% CF4 impurity content, the discharge reaches stationary distributions of plasma parameters. In this case, the cathode and anode layers of the space charge, a narrow layer near the electron-ion plasma near the cathode layer and ion-ion plasma are formed. In the case of a small impurity of 1% CF4 impurity, the discharge remains non-stationary over the entire considered time range. For the considered ranges of external parameters, the main products of CF4 conversion are atomic F and molecular fluorine F2, as well as CF3.