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<p>Nitride materials, valued for their structural stability and exceptional physical properties, have garnered significant interest in both fundamental research and technological applications. The fabrication of high-quality nitride thin films is essential for advancing their use in microelectronics and spintronics. Yet, achieving single-crystal nitride thin films with excellent structural integrity remains a challenge. Here, we introduce a straightforward yet innovative metallic alloy nitridation technique for the synthesis of stable single-crystal nitride thin films. By subjecting metal alloy thin films to a controlled nitridation process, nitrogen atoms integrate into the lattice, driving structural transformations while preserving high epitaxial quality. Combining nanoscale magnetic imaging with scanning nitrogen-vacancy (NV) magnetometry, X-ray magnetic linear dichroism, and comprehensive transport measurements, we confirm that the nitridated films exhibit a robust antiferromagnetic character with a zero net magnetic moment. This work not only provides a refined and reproducible strategy for the fabrication of nitride thin films but also lays a robust foundation for exploring their burgeoning device applications.</p>

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Advancing antiferromagnetic nitrides via metal alloy nitridation

  • 期刊论文

  • 出版模式：

    开放获取

  • 发表日期：

    2025年7月30日

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  • Qianying Wang,
  • Lele Zhang,
  • Ze-Xu He,
  • Qian Li,
  • Haitao Hong,
  • Ting Cui,
  • Dongke Rong,
  • Songhee Choi,
  • Qiao Jin,
  • Chen Ge,
  • Can Wang,
  • Qinghua Zhang,
  • Liang Cheng,
  • Jingbo Qi,
  • Kui-juan Jin,
  • Gang-Qin Liu,
  • Er-Jia Guo

摘要

Nitride materials, valued for their structural stability and exceptional physical properties, have garnered significant interest in both fundamental research and technological applications. The fabrication of high-quality nitride thin films is essential for advancing their use in microelectronics and spintronics. Yet, achieving single-crystal nitride thin films with excellent structural integrity remains a challenge. Here, we introduce a straightforward yet innovative metallic alloy nitridation technique for the synthesis of stable single-crystal nitride thin films. By subjecting metal alloy thin films to a controlled nitridation process, nitrogen atoms integrate into the lattice, driving structural transformations while preserving high epitaxial quality. Combining nanoscale magnetic imaging with scanning nitrogen-vacancy (NV) magnetometry, X-ray magnetic linear dichroism, and comprehensive transport measurements, we confirm that the nitridated films exhibit a robust antiferromagnetic character with a zero net magnetic moment. This work not only provides a refined and reproducible strategy for the fabrication of nitride thin films but also lays a robust foundation for exploring their burgeoning device applications.