<p>Hexagonal wurtzite structure Er-substituted ZnO dilute magnetic semiconductors (DMSs) thin films have been deposited on sapphire/silicon substrate [(ZnO: Er)<sub>sapphire/silicon</sub>] using DC sputtering technique at room temperature in oxygen-plasma atmosphere and studied their electronic/local atomic-structure and correlated with their magnetic behaviors. Incorporation of Er<sup>+3</sup>-ion in ZnO-lattice [(ZnO: Er)<sub>sapphire/silicon</sub>] and formation of Zn<sup>+2</sup>/O<sup>−</sup> vacancies (V<sub>Zn</sub>/V<sub>0</sub>) at the bonding between Zn and O<sub>2</sub> may induces room temperature ferromagnetism. Magnetic M-H loops of pure-ZnO shows diamagnetic behaviour, whereas (ZnO: Er)<sub>sapphire/silicon</sub> are ferromagnetic in nature. Moreover, (ZnO: Er)<sub>sapphire</sub> is higher ferromagnetic (saturation magnetization, M<sub>S</sub> ≈2.3 emu/g, coercivity, H<sub>C</sub> ≈63 Oe) than (ZnO: Er)<sub>silicon</sub> (M<sub>S</sub> ≈0.5 emu/g, H<sub>C</sub> ≈15 Oe). Incorporation of Er<sup>+3</sup>-ion and formation of V<sub>Zn</sub>/V<sub>0</sub> vacancies were observed from x-ray photoelectron spectroscopy (XPS) and x-ray absorption near edge structure (XANES) spectroscopy analysis. The peak positions of Zn 3<i>p</i> and O 1<i>s</i> in XPS spectrum of (ZnO: Er)<sub>sapphire/silicon</sub> thin films are shifted at higher energy levels compared to pure ZnO, indicating that the behaviors of (ZnO: Er)<sub>sapphire/silicon</sub> thin films are substrate dependent. XANES study of Zn <i>K</i>-edge/Zn <i>L</i><sub>3</sub>-edge shows the transition of Zn 1<i>s</i> →4<i>p</i> / Zn 2<i>p</i> → Zn 4<i>s</i>3<i>d</i> in antibonding states of Zn; whereas Er <i>L</i><sub>3</sub>-edge is the transition of 2<i>p</i>→5<i>d</i> states of Er upon x-ray absorption that demonstrates the local atomic structure around Er in the (ZnO: Er)<sub>sapphire/silicon</sub> thin films. These transitions reveal the host-lattice in Zn-sites is substituted with Er<sup>3+</sup>-ions to preserve the symmetry with negligible distortion. The O <i>K</i>-edge shows the transition of O 2<i>p</i> - Zn 4<i>s</i> hybridized states through charge transfer the oxygen bands (Er-O-Zn) that reduced slightly atomic radius of Zn-O/Er-O/Zn-Zn found from extended x-ray absorption fine structure study, implies (ZnO: Er)<sub>sapphire</sub> is higher ferromagnetic behaviour than (ZnO: Er)<sub>silicon</sub>. The defect emission bands also identified through Er-substitution indicated that the emissions changed the diamagnetic-ZnO into room temperature ferromagnetic DMSs (ZnO: Er)<sub>sapphire/silicon</sub> thin film that could be useful for optoelectronic/magnetic applications.</p>

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Sapphire/silicon-substrate dependent magnetism of Er-substituted ZnO (ZnO: Er) thin film: x-ray absorption near edge structure (XANES) study

  • Shivani Das,
  • Kuan-Hung Chen,
  • Tapaswini Chhotaray,
  • Wei-Xuan Lin,
  • Surajit Ghosh,
  • Dilip Kumar Mishra,
  • Sekhar Chandra Ray,
  • W. F. Pong

摘要

Hexagonal wurtzite structure Er-substituted ZnO dilute magnetic semiconductors (DMSs) thin films have been deposited on sapphire/silicon substrate [(ZnO: Er)sapphire/silicon] using DC sputtering technique at room temperature in oxygen-plasma atmosphere and studied their electronic/local atomic-structure and correlated with their magnetic behaviors. Incorporation of Er+3-ion in ZnO-lattice [(ZnO: Er)sapphire/silicon] and formation of Zn+2/O vacancies (VZn/V0) at the bonding between Zn and O2 may induces room temperature ferromagnetism. Magnetic M-H loops of pure-ZnO shows diamagnetic behaviour, whereas (ZnO: Er)sapphire/silicon are ferromagnetic in nature. Moreover, (ZnO: Er)sapphire is higher ferromagnetic (saturation magnetization, MS ≈2.3 emu/g, coercivity, HC ≈63 Oe) than (ZnO: Er)silicon (MS ≈0.5 emu/g, HC ≈15 Oe). Incorporation of Er+3-ion and formation of VZn/V0 vacancies were observed from x-ray photoelectron spectroscopy (XPS) and x-ray absorption near edge structure (XANES) spectroscopy analysis. The peak positions of Zn 3p and O 1s in XPS spectrum of (ZnO: Er)sapphire/silicon thin films are shifted at higher energy levels compared to pure ZnO, indicating that the behaviors of (ZnO: Er)sapphire/silicon thin films are substrate dependent. XANES study of Zn K-edge/Zn L3-edge shows the transition of Zn 1s →4p / Zn 2p → Zn 4s3d in antibonding states of Zn; whereas Er L3-edge is the transition of 2p→5d states of Er upon x-ray absorption that demonstrates the local atomic structure around Er in the (ZnO: Er)sapphire/silicon thin films. These transitions reveal the host-lattice in Zn-sites is substituted with Er3+-ions to preserve the symmetry with negligible distortion. The O K-edge shows the transition of O 2p - Zn 4s hybridized states through charge transfer the oxygen bands (Er-O-Zn) that reduced slightly atomic radius of Zn-O/Er-O/Zn-Zn found from extended x-ray absorption fine structure study, implies (ZnO: Er)sapphire is higher ferromagnetic behaviour than (ZnO: Er)silicon. The defect emission bands also identified through Er-substitution indicated that the emissions changed the diamagnetic-ZnO into room temperature ferromagnetic DMSs (ZnO: Er)sapphire/silicon thin film that could be useful for optoelectronic/magnetic applications.