<p>The family of MAX phase compounds has emerged as promising engineering materials with potential applications in various fields, including supercapacitors. Radio frequency sputtering, a low-temperature thin-film deposition process, allows for the precise deposition of Ti-Al-C multilayers. This study investigates the key steps in the formation of Ti<sub>3</sub>AlC<sub>2</sub> thin films on a copper substrate by converting Ti-Al-C multilayers as a function of annealing conditions. X-ray diffraction, scanning electron microscopy analysis, UV-visible spectroscopy, and FTIR spectroscopy provide structural insights. These findings provide significant insights into the development of binder-free and environmentally friendly anodes with copper current collectors. The versatility and performance of our approach make it a promising candidate for the growing demand in the supercapacitor and battery industries.</p>

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Synthesis and structural characterization of MAX phase thin films by radio frequency sputtering and annealing

  • Fatemeh Rostamian,
  • Aziziollah Shafiekhani

摘要

The family of MAX phase compounds has emerged as promising engineering materials with potential applications in various fields, including supercapacitors. Radio frequency sputtering, a low-temperature thin-film deposition process, allows for the precise deposition of Ti-Al-C multilayers. This study investigates the key steps in the formation of Ti3AlC2 thin films on a copper substrate by converting Ti-Al-C multilayers as a function of annealing conditions. X-ray diffraction, scanning electron microscopy analysis, UV-visible spectroscopy, and FTIR spectroscopy provide structural insights. These findings provide significant insights into the development of binder-free and environmentally friendly anodes with copper current collectors. The versatility and performance of our approach make it a promising candidate for the growing demand in the supercapacitor and battery industries.