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<p>Hydrogen atom generation and permeation on nuclear waste storage canister surfaces threaten disposal safety. This study investigated the corrosion behavior of hydrogen-charged and non-charged copper in an anoxic, sulfide-containing groundwater environment simulating nuclear waste disposal conditions in Beishan, China. Chloride ions induced pitting corrosion in non-charged copper. The mass transfer rate of <InlineEquation ID="IEq1"> <EquationSource Format="TEX">\(\text{Cu}{\text{Cl}}_{2}^{-}\)</EquationSource> <EquationSource Format="MATHML"><math> <mrow> <mtext>Cu</mtext> <msubsup> <mrow> <mtext>Cl</mtext> </mrow> <mrow> <mn>2</mn> </mrow> <mrow> <mo>−</mo> </mrow> </msubsup> </mrow> </math></EquationSource> </InlineEquation> species within pitting pores was higher compared to that of Cu⁺ through the Cu<sub>2</sub>S layer, resulting in excessive thickening of corrosion products at pitting sites. By contrast, porous corrosion products on hydrogen-charged copper formed non-passivating films, leading to uniform substrate corrosion. The corrosion product thickness exhibited sub-parabolic growth over time. This predictable sub-parabolic growth pattern is crucial for reliable service life assessment of deep geological repositories rather than unpredictable pitting corrosion.</p>

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Uniform corrosion of hydrogen-charged copper and localized corrosion of non-charged copper in anoxic groundwater containing diluted sulfide

  • 期刊论文

  • 出版模式：

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  • 发表日期：

    2026年4月13日

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  • Xiangju Liu,
  • Nazhen Liu,
  • Zheng Ma,
  • Yuanxia Wang,
  • Yongchao Dai,
  • Chengtao Li,
  • Lijun Song,
  • Quantong Jiang,
  • Jizhou Duan,
  • Baorong Hou

摘要

Hydrogen atom generation and permeation on nuclear waste storage canister surfaces threaten disposal safety. This study investigated the corrosion behavior of hydrogen-charged and non-charged copper in an anoxic, sulfide-containing groundwater environment simulating nuclear waste disposal conditions in Beishan, China. Chloride ions induced pitting corrosion in non-charged copper. The mass transfer rate of \(\text{Cu}{\text{Cl}}_{2}^{-}\) Cu Cl 2 − species within pitting pores was higher compared to that of Cu⁺ through the Cu2S layer, resulting in excessive thickening of corrosion products at pitting sites. By contrast, porous corrosion products on hydrogen-charged copper formed non-passivating films, leading to uniform substrate corrosion. The corrosion product thickness exhibited sub-parabolic growth over time. This predictable sub-parabolic growth pattern is crucial for reliable service life assessment of deep geological repositories rather than unpredictable pitting corrosion.