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<p>Mechanical instabilities produce periodic out-of-plane deformations, but applications remain limited by the need for elastic substrates and weak controllability. Here, we induce coherent, instability-driven buckling in both van der Waals (vdW) layers and underlying amorphous silica at room temperature, achieving precise spatial control and deterministic orientation. Electron-beam builds crystal-axis-dependent stress in α-MoO<sub>3</sub>, while simultaneously facilitating viscous flow in silica, producing sinusoidal wrinkles at subwavelength whose dimension are tunable by α-MoO<sub>3</sub> thickness and electron dose. These wrinkles diffract light as on-chip optical gratings. We show coherent buckling across vdW heterostructures and peel off α-MoO<sub>3</sub> post-buckling, leaving imprinted silica. Similar crystal-aligned wrinkles appear on amorphous Al<sub>2</sub>O<sub>3</sub> and SiN<sub>x</sub>. By removing reliance on elastic substrates, this work extends the scope of instability-driven, lithography-free subwavelength patterning to CMOS-relevant dielectrics.</p>

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Room temperature molding of amorphous dielectrics via van der Waals anisotropy at the nanoscale

  • 期刊论文

  • 出版模式：

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  • 发表日期：

    2026年5月12日

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  • Yifeng Liu,
  • Zhengjie Huang,
  • Xinyan Li,
  • Chen-yang Lin,
  • Aryan Chugh,
  • Tian Lang,
  • Kenji Watanabe,
  • Takashi Taniguchi,
  • Jun Lou,
  • Yanfei Gao,
  • Yimo Han,
  • Xuedan Ma,
  • Hae Yeon Lee

摘要

Mechanical instabilities produce periodic out-of-plane deformations, but applications remain limited by the need for elastic substrates and weak controllability. Here, we induce coherent, instability-driven buckling in both van der Waals (vdW) layers and underlying amorphous silica at room temperature, achieving precise spatial control and deterministic orientation. Electron-beam builds crystal-axis-dependent stress in α-MoO3, while simultaneously facilitating viscous flow in silica, producing sinusoidal wrinkles at subwavelength whose dimension are tunable by α-MoO3 thickness and electron dose. These wrinkles diffract light as on-chip optical gratings. We show coherent buckling across vdW heterostructures and peel off α-MoO3 post-buckling, leaving imprinted silica. Similar crystal-aligned wrinkles appear on amorphous Al2O3 and SiNx. By removing reliance on elastic substrates, this work extends the scope of instability-driven, lithography-free subwavelength patterning to CMOS-relevant dielectrics.