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<p>One of the major challenges in the rapidly advancing field of nanophotonics is creating high-aspect-ratio nanostructures over large-area with consistent precision. Traditional techniques like photolithography and etching fall short, being limited to fabricating structures with a typical feature size of 100 nm and a maximum aspect ratio of 30:1. To break through these barriers, herein we introduce a strategy, called wet-chemical etching assisted aberration-enhanced single-pulsed femtosecond laser-supplemented nanolithography (WEALTH), for manufacturing large-area deep holey nanostructures. This strategy enables fabrication of nanostructures with diameters as small as 25 nm (exceeding 1/30 of Abbe’s diffraction limit), aspect ratios greater than 10<sup>4</sup>:1, and large-area holey lattices spanning 10 mm<sup>2</sup> with potential scalability up to several cm<sup>2</sup>. We have successfully harnessed this technique to develop cutting-edge applications, including immunoassay biosensing chips, large-area nanophotonic crystals, nanophotonic crystal microcavities, and chiral nanophotonic devices. Moreover, it is adaptable to a wide range of materials, including crystals, glasses, and silicon-based semiconductors. Our approach offers high flexibility in customizing large-area holey nanophotonic structures, paving the way for breakthrough advancements in 3D integrated optics.</p>

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25 nm-Feature, 104-aspect-ratio, 10 mm2-area single-pulsed laser nanolithography

  • 期刊论文

  • 出版模式：

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  • 发表日期：

    2025年8月12日

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  • Zhi Chen,
  • Lijing Zhong,
  • Xiangyu Sun,
  • Yihui Fu,
  • Huilin He,
  • Huijiao Ji,
  • Yuying Wang,
  • Xiaofeng Liu,
  • Beibei Xu,
  • Zhemin Wu,
  • Chen Zou,
  • Zhijun Ma,
  • Jingyu Zhang,
  • Guoping Dong,
  • Giuseppe Barillaro,
  • Cheng-Wei Qiu,
  • Jianbei Qiu,
  • Jianrong Qiu

摘要

One of the major challenges in the rapidly advancing field of nanophotonics is creating high-aspect-ratio nanostructures over large-area with consistent precision. Traditional techniques like photolithography and etching fall short, being limited to fabricating structures with a typical feature size of 100 nm and a maximum aspect ratio of 30:1. To break through these barriers, herein we introduce a strategy, called wet-chemical etching assisted aberration-enhanced single-pulsed femtosecond laser-supplemented nanolithography (WEALTH), for manufacturing large-area deep holey nanostructures. This strategy enables fabrication of nanostructures with diameters as small as 25 nm (exceeding 1/30 of Abbe’s diffraction limit), aspect ratios greater than 104:1, and large-area holey lattices spanning 10 mm2 with potential scalability up to several cm2. We have successfully harnessed this technique to develop cutting-edge applications, including immunoassay biosensing chips, large-area nanophotonic crystals, nanophotonic crystal microcavities, and chiral nanophotonic devices. Moreover, it is adaptable to a wide range of materials, including crystals, glasses, and silicon-based semiconductors. Our approach offers high flexibility in customizing large-area holey nanophotonic structures, paving the way for breakthrough advancements in 3D integrated optics.