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<p>Planar cross-scale structures encode position and posture, enabling nanometer-level accuracy and multi-scale cascaded precision, emerging as a potential sensing device for semiconductor manufacturing and inspection systems. However, the fabrication of cross-scale hybrid structures, which is the integration of structures spanning three orders of magnitude in feature dimensions (500 nm–1.5 mm) on single substrates, still faces challenges. This requires fabrication of submicron-periodic encoder arrays (reflective regions) and micron-scale non-periodic absolute code tracks (transmissive regions) while maintaining directional consistency. Herein, we demonstrate a mask-interference hybrid lithography method to generate cross-scale structures. The multi-step lithography process integrates interference lithography for fabricating subwavelength periodic structures and mask lithography for patterning millimeter and micrometer-scale non-periodic structures. Alignment marks etched on the mask enable direction consistency between structural zones. The transmissive and reflective structures are differentially processed through region-specific etching and deposition. The effectiveness of this process in realizing the fabrication of hybrid structures is validated through experimental characterization. Moreover, the inherent process scalability establishes a versatile platform for creating multifunctional photonic architectures.</p><p></p>

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Cross-scale structures fabrication via hybrid lithography for nanolevel positioning

  • 期刊论文

  • 出版模式：

    开放获取

  • 发表日期：

    2025年8月26日

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  • Jingwen Li,
  • Shengtong Wang,
  • Xinghui Li

摘要

Planar cross-scale structures encode position and posture, enabling nanometer-level accuracy and multi-scale cascaded precision, emerging as a potential sensing device for semiconductor manufacturing and inspection systems. However, the fabrication of cross-scale hybrid structures, which is the integration of structures spanning three orders of magnitude in feature dimensions (500 nm–1.5 mm) on single substrates, still faces challenges. This requires fabrication of submicron-periodic encoder arrays (reflective regions) and micron-scale non-periodic absolute code tracks (transmissive regions) while maintaining directional consistency. Herein, we demonstrate a mask-interference hybrid lithography method to generate cross-scale structures. The multi-step lithography process integrates interference lithography for fabricating subwavelength periodic structures and mask lithography for patterning millimeter and micrometer-scale non-periodic structures. Alignment marks etched on the mask enable direction consistency between structural zones. The transmissive and reflective structures are differentially processed through region-specific etching and deposition. The effectiveness of this process in realizing the fabrication of hybrid structures is validated through experimental characterization. Moreover, the inherent process scalability establishes a versatile platform for creating multifunctional photonic architectures.