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<p>Recent advances in flexible sensors are revolutionizing smart sensing applications, including air monitoring, healthcare, and electronic skin (e-skin). These sensors are light, thin, low-cost, and widely accessible, with the potential to transform real-time sensing solutions, especially in developing nations. This work presents the development of a unique polymeric functional platform textured with micro/nanostructures. Here three different techniques–colloidal lithography, laser interference lithography, and photolithography were used to fabricate micro/nanostructured silicon (Si). The structured Si substrate served as a mold for transferring these structures onto a polymeric substrate. A low temperature (85&#xa0;°C), rapid growth of ZnO nanowires (NWs) within 30&#xa0;min was achieved on these replicated structures using the chemical bath deposition (CBD) technique. The structural and morphological characteristics of the resulting ZnO NWs were subsequently examined in details. The XRD analysis confirmed the crystalline nature of the ZnO NWs, while FESEM images revealed the morphology of these NWs. The proposed fabrication technique, due to its simplicity, ease of use and scalability, holds significant potential for real-world applications, such as environmental monitoring.</p>

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Scalable fabrication of micro/nanostructured polymeric functional platforms via advanced lithography techniques

  • 期刊论文

  • 出版模式：

    开放获取

  • 发表日期：

    2026年1月23日

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  • Gulshan Verma,
  • Hind Kadiri,
  • Anisha Gokarna,
  • Komla Nomenyo,
  • Gilles Lerondel,
  • Ankur Gupta

摘要

Recent advances in flexible sensors are revolutionizing smart sensing applications, including air monitoring, healthcare, and electronic skin (e-skin). These sensors are light, thin, low-cost, and widely accessible, with the potential to transform real-time sensing solutions, especially in developing nations. This work presents the development of a unique polymeric functional platform textured with micro/nanostructures. Here three different techniques–colloidal lithography, laser interference lithography, and photolithography were used to fabricate micro/nanostructured silicon (Si). The structured Si substrate served as a mold for transferring these structures onto a polymeric substrate. A low temperature (85 °C), rapid growth of ZnO nanowires (NWs) within 30 min was achieved on these replicated structures using the chemical bath deposition (CBD) technique. The structural and morphological characteristics of the resulting ZnO NWs were subsequently examined in details. The XRD analysis confirmed the crystalline nature of the ZnO NWs, while FESEM images revealed the morphology of these NWs. The proposed fabrication technique, due to its simplicity, ease of use and scalability, holds significant potential for real-world applications, such as environmental monitoring.