The role of lithium doping on the physical properties of nanostructured NiO thin films for applications in optoelectronic devices: theoretical and experimental
摘要
NiO thin films, both pure and Li-doped, were created by depositing films onto base substrates. The produced films for Li doping exhibited a cubic structure, as confirmed by the XRD patterns. AFM analysis of NiO and NiO: Li (300 nm) shows surface roughness: Sz (25.70–35.62 nm), average (3.346–4.390 nm), RMS (4.1195–5.336 nm). SEM reveals morphological changes: Undoped NiO, NiO: 2% Li, and NiO: 4% Li films exhibit nanostructure evolution correlated with Lithium doping. According to an optical investigation, Li doping reduces the band gap. The sample with 2% Li doping had the lowest value. The first principal technique based on density functional theory was employed to analyze the structural, optical, and elastic properties of pure NiO and 4% Li-doped NiO. The lattice parameters are altered upon doping by optimizing the samples’ geometrical characteristics. According to the band structure calculations, the undoped and Li-doped samples displayed a straight band gap, while band gaps of doped NiO were relatively smaller.