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<p>Producing TiO<sub>2</sub> thin film by reactive DC sputtering has attracted considerable interest owing to its widespread applications in optoelectronics and photovoltaics. Three TiO<sub>2</sub> thin films were prepared on glass in situ by reactive DC sputtering at various oxygen flow rates without heat treatment, with good film uniformity. The films were examined for structural and optical properties. X-ray diffraction reveals better crystallinity is in films produced at a moderate O<sub>2</sub> flow ratio (in an argon blend). UV-Visible absorbance reveals that the films have band gaps at 3.80 (for Ar:O<sub>2</sub> 90:10), 3.75 (for Ar:O<sub>2</sub> 80:20, and 3.65&#xa0;eV (for Ar:O<sub>2</sub> 70:30). Fourier-transform infrared spectroscopy confirms the formation of the Ti–O bond.</p>

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Effect of Oxygen Flux on the Structural and Optical Properties of TiO2 Thin Films Prepared by DC Reactive Cathodic Spraying

  • 期刊论文

  • 发表日期：

    2026年7月15日

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  • Sawsan H. Abdullah

摘要

Producing TiO2 thin film by reactive DC sputtering has attracted considerable interest owing to its widespread applications in optoelectronics and photovoltaics. Three TiO2 thin films were prepared on glass in situ by reactive DC sputtering at various oxygen flow rates without heat treatment, with good film uniformity. The films were examined for structural and optical properties. X-ray diffraction reveals better crystallinity is in films produced at a moderate O2 flow ratio (in an argon blend). UV-Visible absorbance reveals that the films have band gaps at 3.80 (for Ar:O2 90:10), 3.75 (for Ar:O2 80:20, and 3.65 eV (for Ar:O2 70:30). Fourier-transform infrared spectroscopy confirms the formation of the Ti–O bond.