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<p>This study investigates the corrosion resistance of LPBF-fabricated AlSi10Mg alloy, focusing on the interplay between process parameters and heat treatments. Volumetric energy densities ranging from 32 to 117&#xa0;J/mm<sup>3</sup> were employed, resulting in different microstructural features and defect types, including lack-of-fusion and keyhole pores. Electrochemical Impedance Spectroscopy (EIS) and Potentiodynamic Polarization (PDP) tests conducted in a 3.5&#xa0;wt.% NaCl solution demonstrated that lower energy densities (&lt; 78&#xa0;J/mm<sup>3</sup>) exhibited improved corrosion resistance, while higher energy densities (≥ 78&#xa0;J/mm<sup>3</sup>) led to accelerated corrosion. Stress-relief heat treatments were conducted on the samples with the best and worst corrosion resistance based on process parameters. Treatment at 200&#xa0;°C had negligible impact on the silicon network and caused only a slight reduction in corrosion resistance, while treatment at 300&#xa0;°C disrupted the silicon network near melt pool boundaries, leading to intensified selective corrosion.</p>

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Correlation of LPBF process parameters and heat treatment with the corrosion behavior of AlSi10Mg alloy

  • 期刊论文

  • 发表日期：

    2025年7月4日

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  • Hossein Laieghi,
  • Muhammad Muteeb Butt,
  • Varma Kvvssn,
  • Ameeq Farooq,
  • Peyman Ansari,
  • Metin U. Salamci,
  • Elmas Salamci

摘要

This study investigates the corrosion resistance of LPBF-fabricated AlSi10Mg alloy, focusing on the interplay between process parameters and heat treatments. Volumetric energy densities ranging from 32 to 117 J/mm3 were employed, resulting in different microstructural features and defect types, including lack-of-fusion and keyhole pores. Electrochemical Impedance Spectroscopy (EIS) and Potentiodynamic Polarization (PDP) tests conducted in a 3.5 wt.% NaCl solution demonstrated that lower energy densities (< 78 J/mm3) exhibited improved corrosion resistance, while higher energy densities (≥ 78 J/mm3) led to accelerated corrosion. Stress-relief heat treatments were conducted on the samples with the best and worst corrosion resistance based on process parameters. Treatment at 200 °C had negligible impact on the silicon network and caused only a slight reduction in corrosion resistance, while treatment at 300 °C disrupted the silicon network near melt pool boundaries, leading to intensified selective corrosion.