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<p>The on-demand patterning of two-dimensional transition metal dichalcogenides (TMDs) with tailored edges are of great importance in their usages in electronic and optoelectronic applications, but remain technically challenging. Herein, we developed a stress-guided anisotropic etching strategy that can produce large-area and well-ordered MoS<sub>2</sub> nanostructures (e.g., nano-ribbons and nano-squares) in a template-free fashion. By creating uniaxially cumulative stress followed by selective thermal etching, the MoS<sub>2</sub> monolayers were statistically etched into ribbon-like structures, the width of which can be manifested and inversely proportional to the applied stress magnitude. In addition, these newly etched edges are found to be macroscopically straight or serrated ones, but predominantly Mo-zigzag terminated and remarkably enhanced the photoluminescence by a factor of ∼8.0. The priority of two edge category experimentally relies on the angle between the stress direction and the crystallographic orientation of MoS<sub>2</sub>, also supported by theoretical calculations. We further demonstrate that biaxial stressing MoS<sub>2</sub> crystals could generate an array of well-defined nano-squares, thereby providing a scalable and versatile patterning route to engineer 2D materials with tailored functional edges, which hold great potential for future electrocatalytic and optoelectronic applications.</p>

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Stress-guided anisotropic etching of MoS2 nanostructure with spatial control over edge structure and morphology

  • 期刊论文

  • 发表日期：

    2026年5月26日

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  • Wenhui Sun,
  • Shuiyan Cao,
  • Wenfa Chen,
  • Ying Liu,
  • Siyuan He,
  • Yuwei Zhang,
  • Tao Zhou,
  • Junchen Wu,
  • Pin Lyu,
  • Jinguo Liu,
  • Dongyang Wan,
  • Mingming Jiang,
  • Caixia Kan,
  • Shisheng Li,
  • Yanpeng Liu

摘要

The on-demand patterning of two-dimensional transition metal dichalcogenides (TMDs) with tailored edges are of great importance in their usages in electronic and optoelectronic applications, but remain technically challenging. Herein, we developed a stress-guided anisotropic etching strategy that can produce large-area and well-ordered MoS2 nanostructures (e.g., nano-ribbons and nano-squares) in a template-free fashion. By creating uniaxially cumulative stress followed by selective thermal etching, the MoS2 monolayers were statistically etched into ribbon-like structures, the width of which can be manifested and inversely proportional to the applied stress magnitude. In addition, these newly etched edges are found to be macroscopically straight or serrated ones, but predominantly Mo-zigzag terminated and remarkably enhanced the photoluminescence by a factor of ∼8.0. The priority of two edge category experimentally relies on the angle between the stress direction and the crystallographic orientation of MoS2, also supported by theoretical calculations. We further demonstrate that biaxial stressing MoS2 crystals could generate an array of well-defined nano-squares, thereby providing a scalable and versatile patterning route to engineer 2D materials with tailored functional edges, which hold great potential for future electrocatalytic and optoelectronic applications.