Design and optimization of a multipole-corrected mass analyzing magnet for high-current low-energy ion implantation system
摘要
A modern high-current, low-energy ion implanter for semiconductor manufacturing requires a dedicated mass analyzing magnet system to achieve high beam transmission and precise mass separation. In this work, we present the design and optimization of a multipole-corrected mass analyzing magnet for a ribbon-beam-based ion implantation system. The system consists of an inductive heated cathode-type ribbon beam source, a 90°-dipole bending magnet, two quadrupole magnets, and a mass resolving slit. This horizontal ribbon beam is more susceptible to nonlinear effects such as space charge and fringe field than other conventional particle accelerator beams. Multipole fields are utilized to correct higher-order aberration and nonlinear components by multi-section design and optimization of pole shape. This paper presents magnet system design and optimization results from three-dimensional electromagnetic field and self-consistent particle tracking simulation.