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<p>The effect of in-situ O<sub>2</sub> plasma treatment on the properties of D-CVD-grown Al<sub>2</sub>O<sub>3</sub> layers was investigated. The Al<sub>2</sub>O<sub>3</sub> layers were prepared with a high deposition rate, and their surface roughness, density, stoichiometry, and water vapor permeation barrier properties were evaluated before and after the plasma treatment. The results showed that the O<sub>2</sub> plasma treatment significantly reduced the surface roughness and density of the Al<sub>2</sub>O<sub>3</sub> layer, while also curing the pores and defects present on its surface. The treatment led to the migration of Al and oxygen adatoms, resulting in a change in the atomic concentration ratio of Al to O and the formation of a strong bonding structure in the Al<sub>2</sub>O<sub>3</sub> layer. Furthermore, the water vapor transmission rate (WVTR) of the O<sub>2</sub> plasma-treated Al<sub>2</sub>O<sub>3</sub> layer remained low and stable over a prolonged exposure time of 2500 h, demonstrating its enhanced water vapor barrier performance. In contrast, the WVTR of the non-treated Al<sub>2</sub>O<sub>3</sub> layer increased significantly after 100 h of exposure. These findings highlight the effectiveness of in-situ O<sub>2</sub> plasma treatment in improving the surface properties and water vapor permeation barrier of D-CVD-grown Al<sub>2</sub>O<sub>3</sub> layers, making them promising candidates for various applications requiring high barrier properties.</p>

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Effects of in-situ plasma treatment on water-vapor permeation barrier properties Al2O3 film prepared by plasma-enhanced chemical vapor deposition

  • 期刊论文

  • 发表日期：

    2025年9月2日

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  • Cheol Young Park,
  • Honglae Sohn

摘要

The effect of in-situ O2 plasma treatment on the properties of D-CVD-grown Al2O3 layers was investigated. The Al2O3 layers were prepared with a high deposition rate, and their surface roughness, density, stoichiometry, and water vapor permeation barrier properties were evaluated before and after the plasma treatment. The results showed that the O2 plasma treatment significantly reduced the surface roughness and density of the Al2O3 layer, while also curing the pores and defects present on its surface. The treatment led to the migration of Al and oxygen adatoms, resulting in a change in the atomic concentration ratio of Al to O and the formation of a strong bonding structure in the Al2O3 layer. Furthermore, the water vapor transmission rate (WVTR) of the O2 plasma-treated Al2O3 layer remained low and stable over a prolonged exposure time of 2500 h, demonstrating its enhanced water vapor barrier performance. In contrast, the WVTR of the non-treated Al2O3 layer increased significantly after 100 h of exposure. These findings highlight the effectiveness of in-situ O2 plasma treatment in improving the surface properties and water vapor permeation barrier of D-CVD-grown Al2O3 layers, making them promising candidates for various applications requiring high barrier properties.