Cathodic Cage Plasma Deposition of Ag/Porous Silicon as a Scalable Route To SERS Substrates
摘要
We report the fabrication of highly sensitive and reproducible surface-enhanced Raman spectroscopy (SERS) substrates based on porous silicon (PSi) decorated with silver nanoparticles (AgNPs) using the Cathodic Cage Plasma Deposition (CCPD) technique. Unlike conventional sputtering or wet-chemical methods, CCPD enables uniform AgNP coverage across the porous network at low cost and with high deposition efficiency. The resulting PSi@AgNPs substrates exhibit a well-controlled pore morphology with homogeneous nanoparticle distribution, as confirmed by FEG-SEM and EDS analyses. Using Crystal Violet (CV) as a model analyte, the substrates achieve detection limits down to ~ 7 ppb and enhancement factors on the order of 10⁵, with relative standard deviations below 20% for most characteristic bands. These results demonstrate that CCPD provides a scalable and versatile route for engineering SERS-active nanostructures, bridging sensitivity, reproducibility, and manufacturing simplicity. Our findings highlight CCPD@PSi as a promising platform for low-cost and reliable SERS sensors in chemical, environmental, and biomedical applications.