Dual-Material Double Gate GaAsSb/InGaAs Heterojunction TFET with Low-k Oxide Layer on Si Substrate for Label-free Biosensor Application: A Simulation Study
摘要
This paper presents a novel biosensor based on a dual-material double-gate GaAsSb/InGaAs heterojunction tunnel FET with a low-k dielectric layer on a silicon substrate. Calibrated TCAD simulations demonstrate that the proposed structure achieves enhanced sensitivity and power efficiency compared to conventional single-gate or high-k designs. Key findings show that the biosensor exhibits high sensing characteristic in response to biomolecular charge and dielectric constant, with tunable performance under different bias conditions. Specifically, at a drain voltage of 0.5 V, the proposed biosensor achieves a maximum current sensitivity of