Enhancing Device Performance with Circular Layout Transistors: A Comparative Study of CDGT and CSNT
摘要
Circular layout Transistors provide an effective approach to mitigating short-channel effects (SCEs) in advanced technology nodes. This study explores the design and simulation of Circular Double Gate Transistors (CDGTs) and Circular Stacked Nanosheet Transistors (CSNTs) for high-performance (HP) applications at a 10 nm gate length. The devices were designed using gds2mesh process and evaluated through fully calibrated TCAD simulations to analyze both DC and analog/RF performance. The CSNT exhibited superior DC characteristics, achieving the highest ON-state drive current (ION) of 2.27 × 10–3 A and the lowest OFF-state leakage current (IOFF) of 5.38 × 10–9 A. Furthermore, it demonstrated an impressive switching ratio (ION/IOFF) of 4.23 × 105, marking a 3.7 × improvement over the CDGT. The CSNT also outperformed the CDGT in analog/RF performance, reinforcing its potential for next-generation nanoelectronic applications. These findings establish CSNTs as promising candidates for future transistor architectures, offering enhanced scalability and performance in advanced semiconductor technologies.