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<p>Multi-crystalline Silicon (mc-Si) wafer’s surface texturing can increase solar cell’s conversion efficiency by lowering incident light reflectance. In this work, the optical characteristics of mc-Si wafers are enhanced through acid texturization. The major aim of this study is to reduce NO<sub>2</sub> emissions. Instead of HNO<sub>3</sub>, we employed a combination of HF and H<sub>2</sub>O<sub>2</sub>, which are less hazardous chemical acids. This work highlights the benefits of using less hazardous and more affordable chemicals. Etching was carried out using a variety of chemical acids in different ratios. We prepared a 0.1&#xa0;M solution of KMnO<sub>4</sub> and used in HF: H<sub>2</sub>O<sub>2</sub>:KMnO<sub>4</sub> in a 3:2:1 ratio. The outcomes of the 60-s etching process were compared with those of raw wafers. Optical microscopy, scanning electron microscope (SEM), UV–visible reflectance and lifetime measurements were used to examine the etched mc-Si wafer. The presence of H<sub>2</sub>O<sub>2</sub> reduces the pollution and enhances the utilization of incident photons in solar cell applications.</p> Graphical Abstract <p></p>

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Green Etching Technologies: Reducing NO2Emissions while Enhancing Solar Cell Efficiency in Industrial Silicon Wafer Etching

  • 期刊论文

  • 发表日期：

    2025年3月26日

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  • Mariyappan Raman,
  • Sugunraj Sekar,
  • Srinivasan Manickam,
  • Keerthivasan Thamotharan,
  • Ramasamy Perumalsamy

摘要

Multi-crystalline Silicon (mc-Si) wafer’s surface texturing can increase solar cell’s conversion efficiency by lowering incident light reflectance. In this work, the optical characteristics of mc-Si wafers are enhanced through acid texturization. The major aim of this study is to reduce NO2 emissions. Instead of HNO3, we employed a combination of HF and H2O2, which are less hazardous chemical acids. This work highlights the benefits of using less hazardous and more affordable chemicals. Etching was carried out using a variety of chemical acids in different ratios. We prepared a 0.1 M solution of KMnO4 and used in HF: H2O2:KMnO4 in a 3:2:1 ratio. The outcomes of the 60-s etching process were compared with those of raw wafers. Optical microscopy, scanning electron microscope (SEM), UV–visible reflectance and lifetime measurements were used to examine the etched mc-Si wafer. The presence of H2O2 reduces the pollution and enhances the utilization of incident photons in solar cell applications.

Graphical Abstract