<p>The study explores the optical properties of TiO<sub>2</sub>/Si/Ag(Cr)/TiN<sub>x</sub> multilayer films, as well as the electrical, optical, and thermal characteristics of ZnO/Ag/ZnO and ZnO/(Cu/Al-doped) Ag/ZnO multilayer films. Using Rutherford Backscattering Spectrometry (RBS), we elucidated the chemical composition and depth distribution of TiO<sub>2</sub>/Si/Ag(Cr)/TiN<sub>x</sub> films. There are low-emissivity coatings present since the optical transmittance analysis revealed strong visible transmittance and low infrared transmittance. Doping concentrations had an impact on the optical properties of ZnO/Ag/ZnO and ZnO/(Cu/Al-doped) Ag/ZnO films, as well as their electrical resistance. Through annealing treatments, we observed improved thermal endurance, with Cu-doped films demonstrating enhanced resistance stability and Al-doped films exhibiting significant resistance reduction post-annealing. These findings contribute significantly to our understanding of thin film properties, underscoring the influence of composition, doping, and thermal processes on optical and electrical performance, essential for a broad spectrum of applications ranging from electronics to thermal management.</p>

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Advanced multilayer thin films for stealth applications: optical, electrical, and thermal enhancements—a comprehensive study

  • Rohit Bharti,
  • Mohammad Mursaleen Butt,
  • Abhijit Dey

摘要

The study explores the optical properties of TiO2/Si/Ag(Cr)/TiNx multilayer films, as well as the electrical, optical, and thermal characteristics of ZnO/Ag/ZnO and ZnO/(Cu/Al-doped) Ag/ZnO multilayer films. Using Rutherford Backscattering Spectrometry (RBS), we elucidated the chemical composition and depth distribution of TiO2/Si/Ag(Cr)/TiNx films. There are low-emissivity coatings present since the optical transmittance analysis revealed strong visible transmittance and low infrared transmittance. Doping concentrations had an impact on the optical properties of ZnO/Ag/ZnO and ZnO/(Cu/Al-doped) Ag/ZnO films, as well as their electrical resistance. Through annealing treatments, we observed improved thermal endurance, with Cu-doped films demonstrating enhanced resistance stability and Al-doped films exhibiting significant resistance reduction post-annealing. These findings contribute significantly to our understanding of thin film properties, underscoring the influence of composition, doping, and thermal processes on optical and electrical performance, essential for a broad spectrum of applications ranging from electronics to thermal management.