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<p>The creation of fine grating structures is a foundational requirement for research and industry alike. Over time the demands have evolved for flexible, nanometer-size patterns with different orientation on three dimensional surfaces with extremely large extent. This article discusses methods to realize this through scanning beam interference lithography (SBIL). Its realization requires the careful design of complex opto-mechanical systems to achieve necessary adjustability while maintaining phase stability between the interfering beams. Hence, a novel adjustable tool to exploit three dimensionally interfering exposure beams for the lithography of one dimensional gratings with precise adjustment to the substrate is introduced. In particular, a recent design methodology regarding the minimization of metrological uncertainty is applied in this study to estimate and prevent unfeasible designs and ensure long-term stability and consistency of the lithography process. The successful design is tested via a first exposure of a linear grating structure with a pitch of 551&#xa0;nm and a spot-size of 3&#xa0;<InlineEquation ID="IEq1"> <EquationSource Format="TEX">\(\upmu \)</EquationSource> </InlineEquation>m with seamless stitching on a range over 13&#xa0;<InlineEquation ID="IEq2"> <EquationSource Format="TEX">\(\upmu \)</EquationSource> </InlineEquation>m.</p>

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Design of a Compact Tool for Variable Scanning Beam Interference Lithography

  • 期刊论文

  • 出版模式：

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  • 发表日期：

    2026年8月5日

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  • Johannes Belkner,
  • Ingo Ortlepp,
  • Kevin Treptow,
  • Josias Rühle,
  • Sebastian O. Siebenhaar,
  • Christof Pruß,
  • Tobias Haist,
  • Oliver Sawodny,
  • Stephan Reichelt,
  • Eberhard Manske,
  • Thomas Kissinger

摘要

The creation of fine grating structures is a foundational requirement for research and industry alike. Over time the demands have evolved for flexible, nanometer-size patterns with different orientation on three dimensional surfaces with extremely large extent. This article discusses methods to realize this through scanning beam interference lithography (SBIL). Its realization requires the careful design of complex opto-mechanical systems to achieve necessary adjustability while maintaining phase stability between the interfering beams. Hence, a novel adjustable tool to exploit three dimensionally interfering exposure beams for the lithography of one dimensional gratings with precise adjustment to the substrate is introduced. In particular, a recent design methodology regarding the minimization of metrological uncertainty is applied in this study to estimate and prevent unfeasible designs and ensure long-term stability and consistency of the lithography process. The successful design is tested via a first exposure of a linear grating structure with a pitch of 551 nm and a spot-size of 3  \(\upmu \) m with seamless stitching on a range over 13  \(\upmu \) m.