Thermal-Force Interaction and its Impact on Material Removal During Shear Thickening Polishing
摘要
Shear thickening polishing (STP) takes advantage of the unique rheological properties of shear thickening fluid and is highly sensitive to temperature changes during the polishing process. The thermal-mechanical interaction in the STP process and its influence on the material removal rate (MRR) are investigated. A theoretical model is established to clarify the mathematical relationship between force and heat. Due to extremely low coefficient of thermal expansion, quartz glass is used as the substrate to explore the influence of thermal-force on MRR during the polishing process. In this study, the mutual influence between the temperature of the polishing slurry and the polishing force, as well as their effects on MRR and surface topography, was investigated. The results indicate that an increase in temperature will significantly reduce the viscosity and polishing power of shear thickening fluid (STF). As the rotational speed increases, the polishing force also increases, and the STF at high shear rates is more likely to enter the shear-thickening state. These findings provide a basis for the precise control of MRR and lay the foundation for the potential applications of STP related to temperature and polishing force.