<p>Nano-structured Ni thin films were deposited on silicon substrates using D.C. magnetron sputtering to observe the changes in crystallite size, lattice strain, thickness, roughness, density, and magnetic properties under various growth conditions. Grazing-incidence X-ray diffraction measurements were performed on the films at different incident angles for each film. The crystallite sizes, lattice strain, and dislocation density for each film at different penetration depths were calculated and analyzed. An increase in the crystallite size and a decrease in the strain with substrate heating and post-deposition annealing were observed to different extents. Crystallite sizes were also seen to increase with penetration depth. The thicknesses of the films were measured using X-Ray Reflectivity. The magnetic properties were investigated using SQUID analysis. The structural and magnetic properties of the films were correlated.</p>